·差式泵歧管，通过法兰与过程反应室连接

·电子附着选件，具有可调谐的离子源，用于表观电势MS
·Penning规和互锁装置可提供过压保护
·信号选通分辨率1μs，用于研究脉冲等离子体或能量、质量分布VS时间
·标准分析中性粒子、自由基，+ve / -ve 离子分析可选

·灵敏度高 / 极稳定的3级过滤四极杆

·质量数范围：     0 ~ 2500amu

·脉冲离子计数检测器，7个数量级的动态范围

·能量分析选件，标准 ±100eV（1000eV可选 ）

·Mu-Metal, Radio-metal屏蔽可选， 高压操作可选
·通过RS232、RS485或Ethernet LAN ，软件MASsoft 控制

Mass Spectrometers for Thin Films, Plasma and Surface Engineering (1.1 MB)

Mass Analysis of CF3I Decomposition in a Surface Barrier Discharge - GEC 2011 (2.8 MB)

Mass Spectroscopy of Metastable Atomic Species in Gas Analysis and Processing Plasmas at High Spectrometer Source Pressures - AVS 2011 (1.6 MB)

Mass Spectroscopy of Metastable Species during Plasma Processing - GEC 2011 (2.1 MB)

Time Resolved Ionisation Studies of HIPIMS - PSE 2006 (848 KB)

Mass Spectrometry in HiPIMS Plasmas - COST Workshop 2012 (3.2 MB)